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Vue d'ensemble
G茅nie 茅lectrique : Basic techniques in the fabrication of microelectronic circuits. Four-point probe, alloyed contacts, diffusion processes, ion implantation epitaxy, silicon dioxide, photolithography, selected diffusion and metallization, transistor fabrication, dry etching, monolithic integrated circuits, isolation, mask making, thin and thick film components, MOS gate voltage and integrated circuits.
Terms: This course is not scheduled for the 2010-2011 academic year.
Instructors: There are no professors associated with this course for the 2010-2011 academic year.
- (3-0-6)
- Prerequisite: ECSE 432 or ECSE 533